Product Profile
· EHDJet series electrohydrodynamic printing equipment, originated from the original high-resolution electrojet printing technology of the State Key Laboratory of Digital Manufacturing Equipment and Technology of Huazhong University of Science and Technology, won the first prize of the 2017 Natural Science Award of Hubei Province and the 2014 International Exhibition of Geneva Inventions Gold Award; Multi-functional electrohydrodynamic inkjet printing system, using electrohydrodynamics (EHD) principle, combined with high-precision motion platform, to achieve micron/nano-level dot printing, line structure direct writing, so as to prepare preset patterns and Structure; equipped with high-speed vision system, high-precision multi-degree-of-freedom motion platform, precision ink supply system and other functional modules, suitable for organic/inorganic inks with viscosity of 1-10000cPs, integrated on-demand spot spraying, direct spinning writing, and atomized film making A variety of printing modes, support vector graphics, bitmaps and other graphics input, high-precision preparation of micro-nano-level dot / dot matrix, line / curve, thin film structure and other complex micro-nano patterns. Process resolution: point spray diameter <1μm, spinning line width <1μm, atomized film thickness ~50nm, provide a cost-effective electrojet printing platform, assist flexible electronic devices, flexible touch screen, flexible sign patch, solar thin film battery, flexible Scientific research and application in the fields of sensors, biological scaffolds, tissue engineering, organic light-emitting diodes, biosensors, etc.

Product Features

Integrate three printing modes: on-demand dot spraying, spinning and atomizing film production

Product Advantages

· Basic pattern printing (all kinds of two-dimensional structures printed by electrofluid)

· Preparation of micro-nano unit (manufacturing micron to submicron RGB/quantum dot pattern)

· Flexible packaging film (preparation of flexible OLED packaging film)

· Photosensitive resin material (preparation of micron optical lens)

· Straight-write corrugated structure (direct preparation of PVDF secondary corrugated fiber, device tensile capacity increased to 320%)

· Electrofluid lithography technology (current photoresist solution can be printed, micro-nano mask pattern is prepared, compatible with lithography patterning process)

· Photoresist pattern (mask to prepare micron network electrode)

· Film capacitor devices (electric fluid atomizing graphene film to prepare film capacitor devices) 

Technical Parameters